Silicon carbide chemical vapor deposition epitaxy equipment
Silicon carbide epitaxy equipment belongs to the field of semiconductor equipment and occupies a key upstream link in the third-generation semiconductor industry chain. Our silicon carbide epitaxy equipment adopts independent innovative structural design, and is compatible with 6-inch and 4-inch epitaxial wafer growth. It is the first completely independent and innovative silicon carbide epitaxy equipment in China with excellent process indicators, low cost of consumables and low maintenance frequency. .
Main applications of silicon carbide epitaxial wafers
New energy vehicles
Rail
Industrial Internet
UHV
Charging pile
Wind power
Photovoltaic
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